Surface cleaning and roughening (Ion Source or RF Plasma Clean)
Process technology Sus/Cu/Sus film thickness: 150/1000~6000/300nm
ABF substrate manufacturing process foundry
ABF substrate manufacturing process foundry
ABF substrate manufacturing process foundry
Dry water after washing and pickling (3%-5% sulfuric acid)
Enter the baking furnace, bake at high temperature to remove moisture
Surface cleaning and roughening (Ion Source or RF Plasma Clean)
Ti process, the film thickness must reach 0.1μm
Cu process, the film thickness must reach 2μm
Compound substrate manufacturing process foundry
Compound substrate manufacturing process foundry
Compound substrate manufacturing process foundry
Surface cleaning and roughening (Ion Source or RF Plasma Clean)
Al process, the film thickness must reach 0.3μm
Ti process, the film thickness must reach 0.15μm
Passive component manufacturing
Compound substrate manufacturing process foundry
Compound substrate manufacturing process foundry
Ceramic substrate
Surface cleaning and roughening (Ion Source or RF Plasma Clean)
TaN process, the film thickness must reach 0.125μm
TaO process, the film thickness must reach 0.125μm
Automotive panel industry
Provide one-stop service
Customized design and manufacturing
IM-ITO film design and process introduction
Mass production parameter adjustment and SPC Control establishment
High-level panel industry
AR anti-reflection applications are used on high-end display panels to make the picture clearer, less reflective, and to see the true nature of the picture more clearly
In the above picture, AR is not used on the left side and AR is used on the right side. The picture on the left completely loses color saturation and clarity, and there are obvious light reflection images
地址: 台南市安南區怡安路二段599號8樓之2
Address:RM. 2, 8F., NO. 599, SEC. 2, YI'AN RD., ANNAN DIST., TAINAN CITY , TAIWAN (R.O.C.)